Meng Shi with Xuan Gao

Atomic Layer Deposition System Design

In the process of nanofabrication, deposition techniques are always extremely important. Factors such as large area, conformity and reproducibility can affect the end results dramatically. Using the technique of atomic layer deposition (ALD), large quantities of conformal film can be coated onto a wide array of substrate material. This technique also has the benefit of simple and accurate control over deposition thickness, and allows very thin alternating stacks of materials to bond to a surface. Commercial products are extremely expensive, however the theoretical setup for ALD is not that complicated. The goal of this project is to design and build a working ALD system using purchased parts that will ultimately cost only a fraction of the retail price.